Example: bachelor of science
Nanoimprint Lithography
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Patterning of light-extraction nanostructures on sapphire ...
www.princeton.edunanoimprint lithography. The SiO 2 mask patterning has five key steps (figures 1(a)–(d)): (1) deposition of a 350nm thick SiO 2 layer on sapphire by plasma-enhanced chemical vapor deposition at 250°C, using a mixture of silane (SiH 4)and nitrous oxide (N 2O); (2) UV nanoimprint lithography of nanoholes with 200nm pitch and 125nm diameter ...
Nanoscale silicon field effect transistors fabricated using ...
www.princeton.edunanoimprint lithography. With this lithographic technique and dry etching, we have patterned a variety of nanoscale transistor features in silicon, including 100 nm wire channels, 250-nm-diam quantum dots, and ring structures with 100 nm ring width, over a 232 cm lithography field with good uniformity.