Exposure of photoresists
Found 9 free book(s)
Exposure of Photoresists - MicroChemicals
microchemicals.com01 Chapter MicroChemicals® – Fundamentals of Microstructuring www.MicroChemicals.com info@MicroChemicals.com Basics of Microstructuring, Exposure ® AZ®
LOR and PMGI Resists - MicroChem
microchem.comLOR and PMGI Resists DESCRIPTION LOR and PMGI resists are based on polydimethylglutarimide. Its unique properties enable LOR and PMGI products to perform exceptionally well
Fabrication of antiscatter grids and collimators for X-ray ...
www.creatvmicrotech.comTECHNICAL PAPER Fabrication of antiscatter grids and collimators for X-ray and gamma-ray imaging by lithography and electroforming Olga V. Makarova Æ Guohua Yang Æ
High Tech Humidification - dristeem-media.com
www.dristeem-media.comPage High Tech Humidification by Kendall Brant Environmental Test Facilities Environmental testing is usually of two broad types, climate and dynamic . Climate testing includes temperature, humidity, salt spray, fungus, and combinations
Advanced WLP Resist Stripping - DuPont
www.dupont.comAdvanced WLP Resist Stripping: Jim Cullen1, Wai Mun Lee2 1 DuPont EKC Technology Ltd. East Kilbride, G74 4QL, UK jcullen@ekctech.com 2 DuPont EKC Technology Inc.,2520 Barrington Ct.,Hayward CA 94545-133 Keywords: HDA®, UBM, Eutectic, NQD, TMAH, NMP, DMSO Abstract This paper outlines the advances made by EKC in developing a solution for WLP resist stripping based
Product Data Sheet Chivacure 300 - Foresight Chem
www.foresight-chem.comwww.chitec.com Photoinitiator for UV Radiation Curing Systems PHOTOINITIATOR Revised Date: May 04, 2010 1/2 WI-DS170
Chemical Structure - xtgchem.cn
www.xtgchem.cnCiba Specialty Chemicals Coating Effects Segment Ciba® IRGACURE® 369 Photoinitiator Edition: 4.9.2001, Basle Ciba Specialty Chemicals Inc. Page 1 of 3
Ciba IRGACURE 379 Photoinitiator - xtgchem.cn
xtgchem.cnCiba Specialty Chemicals Coating Effects Segment Ciba® IRGACURE® 379 Photoinitiator Edition: 9.4.2002, Ba sle Ciba Specialty Chemicals Inc. Page 3 of 3
General Purpose Developer - MicroChemicals
www.microchemicals.comDescription AZ 351B Developer is a general purpose developer for use with almost any positive AZ Photoresist. It was designed to achieve utmost contrast and best wall profile.