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Chemical dry etching of silicon nitride and silicon ...
scme-nm.orgChemical dry etching of silicon nitride and silicon dioxide using CF4/O2/N2 gas mixtures B. E. E. Kastenmeier,a) P. J. Matsuo, J. J. Beulens, and G. S. Oehrleinb) Department of Physics, The University of Albany, State University of New York, 1400 Washington Avenue,