Search results with tag "Nlof"
AZ nLOF 2000 Series - MicroChemicals
www.microchemicals.com2000 Series i-line photoresists are engineered to simplify the historically complex image reversal and multi-layer lift-off lithography processes. Ideal lift- off pattern profiles are achieved using a standard expose/post expose bake/develop process flow. These photoresists are very fast and printed features are thermally stable to >200° C.
AZ nLOF 20xx Negative Resist - MicroChemicals
www.microchemicals.comMicroChemicals GmbH Ulm – www.microchemicals.com - tech@microchemicals.com n Resist Erosion and Development Rate With a sufficient post exposure bake of 110°C for one min-ute, the parameter limiting the extent of cross-linking is the
Exposure of Photoresists - MicroChemicals
microchemicals.comAZ ® 15 ®nXT, AZ 125 nXT or the AZ nLOF 2000 series. Broadband resists also absorb the g- (435 nm) and h- (405 nm) lines, but can also be exposed monochromatically within their spectral sensitivity. Deep-UV Resists Deep-UV resists have a spectral sensitivity below 280 nm wavelength. Through exposure wavelengths
F-3000 F-4201 デジタル撹拌機BL型 - flon-ind.com
www.flon-ind.comf-1000 f-2000 f-3000 f-4000 f-5000 f-6000 f-000 f-000 f-4000 上記価格には消費税は含まれておりません。 フッ製品カタログ v.104 205 f-1000