Transcription of 220 23-34 論文2 吳文定、蔡春進 - isha.org.tw
1 / 23 Color Filter, CF Preventive Maintenance, PM PM CF SEMI S2 CF 10 GC-MS CF PGMEA PGME Phase2-Cr BM PS/OC SEMI S2 1% Occupational Exposure Limit, OEL Phase1 -Cr BM SUB PGMEA ppm SEMI S2 1 ppm SEMI S2 SEMI S2 24 / Color Filter, CF Black Matrix Coating Exposure Developer Stripping Post-bake ITO Sputtering [1] Preventive Maintenance, PM PM cover : 1.
2 Area sampling 2. SEMI S2 3. 4. Volatile Organic Compounds, VOCs 1 / 25 In House TFT LCD 2003 TFT LCD 2 TFT LCD Low Temperature Poly Silicon, LT P S TFT LCD Glass Substrate Black Matrix Color Layer Over Coat Indium Tin Oxides, ITO 1 Pre-bake Aligned Developed 1 Phase NO.
3 FAB-1F Phase1 Phase2 FAB-2F Phase1 Phase2 FAB-2F(SUB) Phase1 Phase2 ITIS [3] 1 Stripping Post-bake R,G,B Pattern Propylene Glycol Methyl Ether, PGME Propylene Glycol Monomethyl Ether Acetate, PGMEA 26 / 2 2003 TFT LCD mm ( ) FAB 1 550*920 FA B 3 IBM - FAB 2 730*920 65 DNP 2001/Q2 FAB 3 620*750 80 DNP 2002/Q4 FAB 4 1300*1400 (G5) 75 DNP 2003/Q4 FAB 1 620*750 40 STI 2001/Q3 ( ) FAB 2 730*920 40 STI 2002/Q4 CF 1 620*750 30 1999/Q4 CF 2 680*880 60 2001/Q4 CF 3 1100*1250 (G5) 75 DNP 2003/Q3 FAB 1 650*750 80 Toppan 2002/Q1 (AMTC) FAB 2 680*880 80 Toppan 2003/Q3 FAB 1 730*920 80 Toppan AMTC 2002/Q3 (CFI) FAB 2 1100*1250 (G5)
4 60 Toppan AMTC 2003/Q3 FAB 1 620*750 15 2002/Q4 FAB 1 1200*1300 (G5) 75 DNP ACTI 2004/Q4 ITIS [3] Edge Bead Remover, EBR EBR PGME PGMEA [1] 3 ( ) Threshold Limit Value, TLV American Conference of Govern-mental Industrial Hygienists, ACGIH / 27 3 ( C) ( C) (mmHg) CH3 COCH3 67-64-1 (CH3)2 CHOH 67-63-0 NH3 7664-41-7 CH3OH 67-56-1 (PGME) CH3 OCH2CH(OH)CH3 107-98-2 C6H12O 108-94-1 CH3 COO(CH2) 2CH(CH3) 2 123-92-2 (PGMEA) CH3CH(OCOCH3)
5 CH2 OCH3 108-65-6 CH3CH2 OCH2CH2OH 110-80-5 HOCH2CH2NH2 141-43-5 N- (NMP) C5H9NO 872-50-4 (TMAH) (CH3) 4 NOH 75-59-2 < HCl 7647-01-0 < HNO3 7697-37-2 < HClO4 7601-90-3 < TLV ACGIH TLV ( )
6 Permissible Exposure Limit, PEL 1972 Occupational Safety and Health Ad-ministration, OSHA 8 OSHA ( ) Occupational Exposure Limit, OEL OELs 28 / ACGIH TLVs OSHA PELs [4] 4 TFT LCD SEMI S2 1% OEL 25% [7] 4 (ppm) SEMI S2 1% OEL(ppm)
7 CH3 COCH3 750 (CH3)2 CHOH 400 4 CH3OH 200 2 (PGME) CH3 OCH2CH(OH)CH3 100 1 C6H12O 25 CH3 COO(CH2)2CH(CH3)2 100 1 (PGMEA) CH3CH(OCOCH3)CH2 OCH3 100 1 CH3CH2 OCH2CH2OH 5 HOCH2CH2NH2 3 N- (NMP)
8 C5H9NO - - / 29 5 canister area sam-pling Gas Chromatogra-phy/Mass Spectrometry, GC/MS [9,10] 10 6 5 MFG PGME PGMEA > 4 2F/Phase1 -Cr BM PM > 4 MFG PGME PGMEA > 4 2F/Phase2 -Cr BM PM > 4 MFG PGME PGMEA > 4 2F/Phase1 -RGB PM > 4 MFG PGME PGMEA > 4 2F/Phase2 -RGB PM > 4 2F/Phase1 -ST Line RD PGME PGMEA > 4 1F/Phase2 -PS/QC MFG PGMEA PGME > 4
9 30 / 6 1 #077 2F/ Phase1-RGB 10:14 16:23 2 #099 2F/ Phase1-RGB 10:16 16:24 3 #006 2F/ Phase1-RGB 10:19 16:25 4 #096 2F/ Phase1-Cr BM 10:22 16:26 5 #097 2F/ Phase1-ST Line 10:28 16:28 6 #093 2F/ Phase 2-RGB 10:34 16:31 7 #100 2F/ Phase 2-Cr BM 10:38 16:40 8 #095 2F(SUB)/ Phase 1- C6(RGB ) 10:46 16:50 9 #092 2F(SUB)/ Phase 1- D18(Cr BM ) 10:52 16:52 10 #094 1F/ Phase 2-PS/QC 10:59 17.
10 00 FAB-1F FAB-2F(SUB) / 31 TO-14 [11] 7 PGMEA PGME FAB-2F ( ppm) FAB-2F Phase1 RGB ST Line Phase1 RGB ST Line Phase2 RGB Coater FAB-2F ppm ( ppm) Phase2 RGB ( ppm) Cr BM( ppm) Phase2 Phase1 PGMEA FAB-2F PGMEA ppm PGMEA Phase1 Cr BM Phase1 Cr BM PGME PGME FAB-2F PGME ppm PGME Phase2 RGB Cr BM RGB Cr BM PGME Coater Coater Nozzle 32 / / 33 (OK73) PGME RGB Cr BM PGME FAB-2F ppm ppm Cr BM PGMEA 1.
