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주사전자현미경의 기본원리와 응용(Part Ⅱ

KIC News, Volume13, , 2010 51 (Part II) Principle and Application of Scanning Electron MicroscopeSeok Kyun Jeong and Jung-Bum ChunElectron Microscope Research Center, COXEM Co., LtdAbstract: topography, morphology, composition crystallography . 30 , 1000 ..Keywords: SEM, electron beam, electron gun, vacuum, electromagnetic lens, coil, EDS1. 1) (Scanning Electron Microscope) 1965 3.

주사전자현미경의 기본원리와 응용(Part Ⅱ) KIC News, Volume 13, No. 1, 2010 53 Figure 3. 전자총 외부, Wehnelt 실린더, 텅스턴 필라멘트 사진.

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Transcription of 주사전자현미경의 기본원리와 응용(Part Ⅱ

1 KIC News, Volume13, , 2010 51 (Part II) Principle and Application of Scanning Electron MicroscopeSeok Kyun Jeong and Jung-Bum ChunElectron Microscope Research Center, COXEM Co., LtdAbstract: topography, morphology, composition crystallography . 30 , 1000 ..Keywords: SEM, electron beam, electron gun, vacuum, electromagnetic lens, coil, EDS1. 1) (Scanning Electron Microscope) 1965 3.

2 , , , , . X SEM . SEM (condenser lens) (objective lens) , (TEM) , (E-mail: spot spot . radiation SEM (secondary electron) . SEM (brightness) . pixel . SEM Figure 1 (electron gun), , (deflection coil).)

3 Stage , . 10 5 torr , 52 , 13 1 , 2010 Figure 1. Column 3 . ( ) CX 100S . , Electronics, . 10 SEM , . (Electron Gun) . (electron ray) . , . ( ; work function).

4 , , . SEM (thermionic electron gun) (field emission electron gun) Figure 2. Hair Pin [9].. (thermal emission) 100 m V (Figure 2). eV , 3650 K , 2700 K . , ( , ) LaB6 (lanthanium hexaboride) , 1900 K . LaB6 . 1 30 kV . Figure 2 (cathode) , wehnelt cylinder, (anode plate).

5 30 kV SEM . Wehnelt cylinder (Part II)KIC News, Volume13, , 2010 53 Figure 3. , Wehnelt , .Table 1. [1] (A/cm2 sr) ( ) (eV) (%) (Pa) 10540 10030 100 m1110 3 LaB6106200 10005 50 m1110 5 Shottky 108108108> 1000> 1000> 1000< 5 nm< 5 nm15 30 155210 710 6wehnelt cylinder , .. (field emission) (cathode), 1 , 2 . W-point tip 600 2000 potential . FE.

6 1 3 5 kV 2 2 30 kV . (CFE ; cold cathode field emitter), (TFE ; thermally assisted field emitter), (SE ; Schottky field emitter) . 3 Schottky , . (Electromagnetic Lens) (Figure 4).. , (demagnification) .. 54 , 13 1 , 2010 Figure 4. e m V . Bz.

7 (Condensing & Objective Lens) 10 50 m 2 1 , 1/10000 5 200 nm .. Figure 4 ( ) . (aperture, 50 200 m) . spot size (spherical aberration) . , . 2 stigmator . scan Figure 5. SEM Beam focusing .generator spot . Stigmator spot spot . (working distance).

8 , , . , working distance .. Figure 7 pin hole 60 conical . (Aperature) Figure 5 anode 2 3 2 nm (Part II)KIC News, Volume13, , 2010 55 Figure 6. Cross 7. Pin hole lens . (a) , (b) 45 conical , (3) 60 conical [2].beam spot . spot SEM . (aperature) spot size (spherical aberration) . (a) 100 m (b) 200 m (c) 600 mFigure 8.

9 [11]. 50 600 m spot size (spherical aberra- tion) depth of field . Depth of field (working distancd) . WD aperture angle WD depth of field .. X Y .. (Stigmator) spot , . (stigmater) , . Stigmater octupole 8 56 , 13 1 , 2010 Figure 9. 8 Stima-tor [11].

10 (pixel) .. , , . Scanning SEM spot . SEM spot . , .. (pixel) SEM spot . 20 30 keV , , , X .. (SED; Secondary Electron Detector) . SEM.


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