Transcription of X射线光电子能谱学》 - USTC
1 X X-Ray photoelectron spectroscopy ~ F. Watts & John Wolstenholme, An introduction to surface analysis by XPS and AES , John Wiley & Sons, Briggs and John T. Grant, Surface Analysis by Auger and X-Ray photoelectron spectroscopy , IM Publications, 2007, ISBN: 1-901019-04-7 Briggs & M. P. Seah, Practical Surface Analysis (Second Edition), Volume 1: Auger and X-ray photoelectron spectroscopy , John Wiley & Sons, H fner, photoelectron spectroscopy : Principles and Applications , Springer-Verlag, 2003, ISBN: C. Smith, Surface Analysis by Electron spectroscopy : Measurement & Interpretation , Plenum Press, New York, 19946.
2 , (XPS AES) 20087. , 20078. , X 1988 X X X X (Outline) XPS 1 XPS 2. 3. 4. 5. X X (X-Ray photoelectron spectroscopy ) XPS ESCA X 1960 XPS X (XPS) X , X , , X ( ) X X XPS XPS 1887 (Heinrich Rudolf Hertz) 1905 (Albert Einstein)
3 1921 1907 Innes X , Helmholtz coils, , , ( ) , XPS , Henry Moseley, Rawlinson and Robinson, 1954 Uppsala Kai Siegbahn XPS (NaCl) , XPS 1967 Siegbahn XPS , , , XPS , ESCA(Electron spectroscopy for Chemical Analysis). 1969 Siegbahn Hewlett-Packard , XPS 1981 Kai Siegbahn XPS 1981 XPS (10~15% ) ~ at% 1~10nm X 10 m( ) 1 m( ) XPS 1.
4 (1~12nm) ( < 10%) at% H He 2. ( ) 3. 4. 5. 6. 7. 8. XPS ( , , , ) (NEMS) (MEMS), ( ) ( ) n=1,2,3,4, .. K, L, M, N l=0, 1, 2, 3.
5 ,(n-1) s,p,d,f j j=|l s| s s=1/2 n, l, j (nlj) 2p3/2, 3d5/2 XPS AES XPS AES XPS AES X 2-1 X nljX 101/2K1s1/2201/2L12s1/211/2L22p1/23/2L32 p3/2301/2M13s1/211/2M23p1/23/2M33p3/223/ 2M43d3/25/2M53d5/2401/2N14s1/211/2N24p1/ 23/2N34p3/223/2N44d3/25/2N54d5/235/2N64f 5/27/2N74f7/2501/2O15s1/24f7/2 4f5/2 4d5/2 4d3/2 4p3/2 4p1/2 4s1/2 3d5/2 3d3/2 3p3/2 3p1/2 3s1/2 2p3/2 2p1/2 2s1/2 1s1/2 K L M N L L M M M M N N N N N N 1 1 1 2 2 2 3 3 3 4 4 5 5 6 7 X A + h A+*+ e ( )
6 X h n - Ei(n) - Ef(n-1,k) EK k (h > EB) A + h A+*+ e :Ei(n) + h = Ef(n-1,k) + EK EK= h EB (1, )( )fiKtottotEhEnkEn (1, )( )fiBtottotEEnkEn nl n l n l n,l l n n,l (~10-16s) h < EB+ >h (X-ray) EB(1s) > EB(2s) > EB(2p)> EB(3s).
7 Z EB(Na 1s) < EB(Mg 1s) < EB(Al 1s) .. EB(7Li 1s) = EB(6Li 1s). ( )1. 2. 3. (Auger Effect) (secondary process) (A+*) ( ) (i) ( ) A+* A++ h ( ) (ii) ( ) A+* A++*+ e (Auger ) (Auger Effect) Pierre Auger 1923 X ( ) X ( XPS ) ( AES)
8 , (Auger Effect) (Auger ) K L1 (EK-EL1) E V Y X W W X W=X Y C-K (Coster-Kronig ) (p>i) L1L2M W=X=Y C-K (p>i q>i) N5N6N6 K L M K KLL KLM KMM KLL KL1L1 KL1L2 KL1L3 KL2L2 KL2L3 : Wi Xp YqWiXpYq(i,p,q ) K L- M- (1) (2) L- M- KLL L-S 5 J-J 6 9 H He Px Pa Px+Pa=1 K : Wapstra.
9 N=1/4 A= 10-2 B= 10-2 C= 10-6 Pa Px Z Z<19 Pa 90% Z=33 Px Pa 13 PPABZCZaan Z Z (K, L, M ) Z<15 K Px 5% 0 KLL LMM MNN Z 15 Z=41 L Z K : Z 3(Li) 13(Al) L : Z 11(Na) 35(Br) M : Z 19(K) 70(Yb) N : Z 39(Y) 94(Pu) Z KLL LMM MNN WXY X Y X Y W 1 KLL LMM MNN NOO ( ) WXY : , (1) S EF EF=0.
10 (2)( )( )( )( )WXYWXYEZE ZE ZE Z ( )( )(1)XXXE ZE ZE Z ( )( )(1)YYYE ZE ZE Z )}()1({)}()1({)()()(2121 ZEZEZEZEZEZEZEYYXXWW YXW XY EZEZEZEZEZEZWXYWXXYYS 121211 EZEZEZEZEZEZWXYWXXYYSp 121211 1 20 ( 10nm).
