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4 Contamination monitoring and analysis in …
Contamination monitoring and analysis in semiconductor manufacturing57 Contamination monitoring and analysis in semiconductor manufacturingBaltzinger Jean-Luc and Delahaye Brunox Contamination monitoring and analysis in semiconductor manufacturing Baltzinger Jean-Luc and Delahaye Bruno Altis Semiconductor France 1. Introduction: Contamination on wafers Definition of the different type of Contamination Contamination is defined as a foreign material at the surface of the silicon wafer or within the bulk of the silicon wafer. The Contamination can be particles or ionic Contamination , liquid The mechanism of Contamination of silicon wafer is summarized on figure 1 (Leroy, 1999): The source of Contamination The transportation of the Contamination The location of the Contamination : surface, bulk
Contamination monitoring and analysis in semiconductor manufacturing 59 second part of this chapter will consider the particle monitoring on bare wafers and
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