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40 - UMC
Nanometer 40 Nanometer UMC s volume production 40-nanometer technology supports today s high performance and low power requirements. Many customers have engaged with UMC for their 40nm projects, with multiple designs in various stages of production. UMC's 40nm utilizes advanced processes such as immersion lithography, ultra shallow junction, mobility enhancement techniques and ultra low-k dielectrics for maximum power and performance optimization. UMC's 40nm process consists of a low power platform (LP) focusing on the low power and low leakage design requirements for mobile and consumer applications, and a generic platform (G) that is optimized for a broad range of consumer and high-speed applications.
40 Nanometer UMC’s volume production 40-nanometer technology supports today’s high performance and low power requirements. Many customers
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