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MOS Capacitor - Chenming Hu

1575 MOS CapacitorCHAPTER OBJECTIVESThis chapter builds a deep understanding of the modern MOS(metal oxide semiconductor) structures. The key topics are the concepts of surfacedepletion, threshold, and inversion; MOS Capacitor C V; gate depletion; inversion-layerthickness; and two imaging devices charge-coupled device and CMOS(complementary MOS) imager. This chapter builds the foundation for understanding theMOSFETs (MOS Field-Effect Transistors).he acronym MOS stands for metal oxide semiconductor. An MOS Capacitor (Fig. 5 1) is made of a semiconductor body or substrate, an insulator film, suchas SiO2, and a metal electrode called a gate. The oxide film can be as thin nm.

advanced transistors (see Section 7.4). The MOS capacitor is not a widely used device in itself. However, it is part of the MOS transistor—the topic of the next tw o chapters. The MOS transistor is by far the most widely used semiconductor device. An MOS transistor (Fig. 5–2) is an MOS capacitor with two PN junctions flanking the capacitor.

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