General Purpose Developer - MicroChemicals
Description AZ 351B Developer is a general purpose developer for use with almost any positive AZ Photoresist. It was designed to achieve utmost contrast and best wall profile.
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Technical Data Sheet Technisches Datenblatt
www.microchemicals.comTechnical Data Sheet Technisches Datenblatt. Development . Immersion Immerse for approximately 60 seconds in either high-contrast or high-speed AZ Developer
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technical datasheet - MicroChemicals
www.microchemicals.comSoft bake times and temperatures may be application specific. Process optimization is recommended to ensure stable lithographic and adhesion performance. Soft bake temperatures for AZ P4000 should be in the 95-115C range. Temperatures towards the high end of this range will improve adhesion to most metals.
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www.microchemicals.comost any application. How ever, the special properties of each resist fami y makes them specially suited for AZ certain fields of application. 2 Resi s t f i lm thi c kness achievable and TI processable with stan d ard equ i pm e nt u n der standa r d conditions. So m e resist s can be dilut e d for lower fi lm thickne s ses; with additional ...
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www.microchemicals.comThe chromium nitrate, which during the etching process forms a dark, constantly new formation on the chromium layer, is very soluble in water and thus in the chromate etchants. Compatibility and Selectivity All of our photoresists are suffi ciently stable in ceric ammonium nitrate and perchloric acid-based etching
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