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Radiofrequency Plasma Sources for Semiconductor Processing

Radiofrequency Plasma Sources for Semiconductor Processing

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Inductively Coupled Plasmas 6.3.1 General Description Though simple and inexpensive, the original CCPs had a number of disadvantages, and a new generation of plasma sources was called for. For instance, the internal electrodes in CCPs introduced unnecessary impurities into the plasma. Until dual-

  Coupled, Inductively, Inductively coupled

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