AN900 APPLICATION NOTE - STMicroelectronics
most frequently used ones. Semiconductors manufacturers purchase wafers predoped with N or P impurities to an impurity level of.1 ppm (one doping atom per ten million atoms of silicon). There are two ways to dope the silicon. The first one is to insert the wafer into a furnace. Doping gases are then introduced which impregnate the silicon surface.
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