Chapter 9 Metal-Semiconductor Contacts
Semiconductor Devices for Integrated Circuits (C. Hu) Slide 9-6 Schottky barrier heights of metal silicide on Si Silicide-Si interfaces are more stable than metal-silicon interfaces. After metal is deposited on Si, an annealing step is applied to form a silicide-Si contact. The term metal-silicon contact includes silicide-Si contacts.
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